A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
- ISBN13 9780792303091
- Publish Date 30 November 1989
- Publish Status Active
- Publish Country NL
- Imprint Springer
- Edition 1990 ed.
- Format Hardcover
- Pages 277
- Language English