Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology, #7)

by M. Sugawara

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Book cover for Plasma Etching

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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
  • ISBN10 019856287X
  • ISBN13 9780198562870
  • Publish Date 28 May 1998 (first published 1 January 1998)
  • Publish Status Active
  • Publish Country GB
  • Imprint Oxford University Press
  • Format Hardcover
  • Pages 356
  • Language English