Materials Science of Thin Films: Deposition and Structure, Third Edition, carries on the tradition of this intriguing series, offering the most comprehensive coverage of materials science and technology related to thin films and coatings of any book in the field. The authors' engaging style brings new coverage to a variety of important topics within the field, including the latest, and most important, deposition techniques, atomic layer deposition and high impulse magnetron sputtering, and new, or expanded, coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, bi-textured layers, surface morphological evolution models, and competitive grain growth.
* Provides the most comprehensive coverage of materials science and technology related to thin films and coatings of any book in the field* Updated to include coverage of the latest and most important deposition techniques, including atomic layer deposition and high impulse magnetron sputtering* Includes new or expanded coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, and more* Carries on the tradition of this intriguing series, offering the latest information on the subject matter
- ISBN13 9780128498934
- Publish Date 29 September 2016
- Publish Status Active
- Publish Country US
- Publisher Elsevier Science Publishing Co Inc
- Imprint Academic Press Inc
- Edition 3rd edition
- Format Paperback
- Pages 864
- Language English