Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
- ISBN13 9781489979438
- Publish Date 23 August 2016 (first published 19 October 2013)
- Publish Status Active
- Publish Country US
- Imprint Springer-Verlag New York Inc.
- Edition Softcover reprint of the original 1st ed. 2014
- Format Paperback
- Pages 263
- Language English