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Master Extreme Ultraviolet Lithography Techniques
Produce high-density, ultrafast microchips using the latest EUVL methods. Written by industry experts, Extreme Ultraviolet Lithography details the equipment, materials, and procedures required to radically extend fabrication capabilities to wavelengths of 32 nanometers and below. Work with masks and resists, configure high-reflectivity mirrors, overcome power and thermal challenges, enhance resolution, and minimize wasted energy. You will also learn how to use Mo/Si deposition technology, fine-tune performance, and optimize cost of ownership.
Design EUVL-ready photomasks, resist layers, and source-collector modules
Assemble optical components, mirrors, microsteppers, and scannersHarness laser-produced and discharge pulse plasma sourcesEnhance resolution using proximity correction and phase-shift Generate modified illumination using holographic elementsMeasure critical dimensions using metrology and scatterometry Deploy stable Mo/Si coatings and high-sensitivity multilayersHandle mask defects, layer imperfections, and thermal instabilities
- ISBN10 0071549196
- ISBN13 9780071549196
- Publish Date 22 December 2008
- Publish Status Cancelled
- Publish Country US
- Imprint McGraw-Hill Professional Publishing
- Format eBook
- Pages 482
- Language English