The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical planarization (CMP) technology, particularly when applied to nanosurfaces. Tribology in Chemical-Mechanical Planarization presents a detailed account of the CMP process in a language that is
- ISBN10 6610516782
- ISBN13 9786610516780
- Publish Date 1 March 2005 (first published 1 January 2005)
- Publish Status Active
- Out of Print 21 August 2012
- Publish Country US
- Publisher Taylor & Francis Ltd
- Imprint CRC Press
- Format eBook
- Pages 198
- Language English