This book provides a comprehensive and updated 'state-of-the-art' compilation on nanolithography and implications on future nanometer IC designs. Its scope in a bottom-up manner, includes the underlying equipment and process issues for nanolithography, the computational lithography aspects, and the key design and CAD issues and possible solutions. The subjects covered include: introduction of nanolithography process and trends; computational lithography (including lithography simulations, OPC, inverse lithography, pixilated mask, source mask optimization, etc.); lithography-aware analysis & design; and, future lithography technologies and EDA impact.
- ISBN10 1441961569
- ISBN13 9781441961563
- Publish Date 1 November 2012
- Publish Status Active
- Publish Country US
- Imprint Springer-Verlag New York Inc.
- Edition 2013
- Format Hardcover
- Pages 400
- Language English