This monograph provides detailed information on the principles, instrumentation, and application of X-ray diffraction at elevated temperatures. More particularly, it summarizes the uses of intense X-ray sources and position-sensitive detectors to assess them in comparison with competing techniques for in situ process analysis at elevated temperatures. This book is intended for use in the training of personnel and in the promotion of the process. Within the areas of X-ray diffraction, materials characterization and thermal analysis, it should be of interest to crystallographers, thermal analysts, materials scientists, physicists, chemists, chemical engineers, and electrical engineers.
- ISBN10 3527278427
- ISBN13 9783527278428
- Publish Date 23 March 1993 (first published 26 February 1993)
- Publish Status Out of Print
- Out of Print 29 September 2011
- Publish Country DE
- Imprint Wiley-VCH Verlag GmbH
- Format Hardcover
- Pages 272
- Language English