Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
- ISBN13 9781118747384
- Publish Date 17 May 2013
- Publish Status Active
- Publish Country US
- Imprint Wiley-Scrivener
- Edition 2nd Revised edition
- Format eBook
- Pages 272
- Language English
- URL http://wiley.com/remtitle.cgi?isbn=1118747380