Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
- ISBN10 0815516398
- ISBN13 9780815516392
- Publish Date 31 December 1988 (first published 1 January 1987)
- Publish Status Active
- Publish Country US
- Publisher William Andrew Publishing
- Imprint Noyes Publications
- Edition Reprint e.
- Format eBook
- Pages 226
- Language English