Design for Manufacturability with Advanced Lithography

by Bei Yu and David Z. Pan

0 ratings • 0 reviews • 0 shelved
Book cover for Design for Manufacturability with Advanced Lithography

Bookhype may earn a small commission from qualifying purchases. Full disclosure.

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
  • ISBN13 9783319203843
  • Publish Date 23 November 2015
  • Publish Status Active
  • Publish Country CH
  • Imprint Springer International Publishing AG
  • Edition 1st ed. 2016
  • Format Hardcover
  • Pages 164
  • Language English