Monte Carlo Modeling for Electron Microscopy and Microanalysis (Oxford Series in Optical and Imaging Sciences, #9)

by David C Joy

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This book describes for the first time how Monte Carlo modeling methods can be applied to electron microscopy and microanalysis. Computer programs for two basic types of Monte Carlo simulation are developed from physical models of the electron scattering process--a single scattering program capable of high accuracy but requiring long computation times, and a plural scattering program which is less accurate but much more rapid. Optimized for use on personal computers, the programs provide a real time graphical display of the interaction. The programs are then used as the starting point for the development of programs aimed at studying particular effects in the electron microscope, including backscattering, secondary electron production, EBIC and cathodo-luminescence imaging, and X-ray microanalysis. The computer code is given in a fully annotated format so that it may be readily modified for specific problems. Throughout, the author includes numerous examples of how such applications can be used. Students and professionals using electron microscopes will want to read this important addition to the literature.
  • ISBN10 0195358465
  • ISBN13 9780195358469
  • Publish Date December 1995 (first published 15 June 1995)
  • Publish Status Active
  • Publish Country GB
  • Imprint Oxford University Press
  • Edition Annotated edition
  • Format eBook
  • Pages 225
  • Language English