Clusters of Interstitial Atoms in Silicon and Germanium (Physical Research S., v. 20)

by Alexandre L. Aseev, etc., Heinz Bartsch, Ludmila I. Fedina, and Detlef Hoehl

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This monograph is the first one in the scientific literature treating the problem of formation of interstitial atom clusters in Si and Ge crystals. The experimental results obtained by means of high resolution and high voltage electron microscopy on atomic (113) - defects are presented. The role of the interaction between interstitials and vacancy complexes is shown in the process of formation of extended defects such as prismatic dislocation loops. The conditions of disappearance of interstitial clusters under the electron irradiation have been determined. The analysis of interactions of interstitials with vacancies, (113)-defects, dislocations, impurity atoms, and crystal surfaces has been carried out in terms of the theory of line rates of quasichemical reactions between point defects and sinks.
  • ISBN10 3055016009
  • ISBN13 9783055016004
  • Publish Date 29 November 1994
  • Publish Status Out of Print
  • Out of Print 13 November 1997
  • Publish Country DE
  • Imprint Wiley-VCH Verlag GmbH
  • Edition English ed.
  • Format Hardcover
  • Pages 150
  • Language English