This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.
- ISBN13 9781402051876
- Publish Date 26 July 2007 (first published 1 January 2007)
- Publish Status Active
- Publish Country US
- Imprint Springer-Verlag New York Inc.
- Edition 2007 ed.
- Format Hardcover
- Pages 255
- Language English